← Every company
Shin-Etsu Chemical Co Ltd Patents
What Shin-Etsu Chemical Co Ltd has filed at the patent office — applications as well as grants, because a filing is on the record eighteen months before anyone has to say what it was for.
SHECY on carbonthat →Filings on file
55
Granted
0
Still pending
55
Filed under
3 names
55 filings
Newest filing first. A pending application has no patent number yet, and most never get one.
| Invention | Patent |
|---|---|
| LAMINATE STRUCTUREC08G 65/007, C09J 171/00, C09J 7/30, C09J2301/312, C08G 77/045, C08G 77/12, C08G 77/14, C08G 77/80, C08L 71/00, C08L 83/04, C09J 11/06, C08L 83/08, C08K 5/5435, C08L 83/00Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-05-20Hiroyuki YASUDA | pending |
| ADVANCED LIFT METHOD AND APPARATUS FOR TRANSFERRING OPTICAL DEVICES USING LASER EMISSION AND PHOTOMASK TECHNIQUESH10H 29/03, H10H 29/02, H10H 20/018, H10W 90/00, Y02P 70/50, H10H 29/142, H10F 71/1278, H10F 71/134, H10H 29/036, H10F 71/1276, H10F 39/107, H10H 20/825, H10H 20/019, H10F 71/127, H10H 20/01335, H10F 30/21, H10F 71/137, H10F 71/139, H10W 72/0198, H10P 72/53, H10W 72/07173, H10P 72/0446, H10W 72/0711, H10W 72/07141, H01S 5/0215, H01S 5/0217, H01S 5/183, H01S 5/423Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-05-01Hiroshi YAMAOKA | pending |
| SELF-HEALING POLYMER MATERIALC08G 71/02, C08G 73/00, C08G 77/54, C08L 79/00Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-04-30Takuzo AIDA | pending |
| METHOD OF PEELING PRESSURE SENSITIVE ADHESIVE TAPE FROM FRAGILE SUBSTRATEC09J 7/38, C09J 129/10, C09J 171/02, C09J 171/03, C09J 7/30, C09J2301/312, C08G 65/007, C08G 77/12, C08G 77/24, C08G 77/385, C08G 77/46, C08L 83/04, C08L 83/08, C08L2201/08, C09J 11/06, C09J 183/04, C09J 183/08, C09J 183/12, C09J2203/318, C09J2427/00, C09J2467/006, C08K 5/56, C08K 5/05, C08L 71/02Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-04-27Hiroyuki YASUDA | pending |
| SILICONE RUBBER PARTICLES AND AQUEOUS DISPERSION OF SILICONE RUBBER PARTICLESC08G 77/20, C08L 83/04, C09D 7/65, C09D 7/70, C09D 7/66, C08G 77/12, C08G 77/70, C08J 3/03, C08J2383/04, C08L 83/00Filed as Shin-Etsu Chemical Co., Ltd.2026-04-02Yoshinori INOKUCHI | pending |
| RESIST COMPOSITION AND PATTERNING PROCESSG03F 7/0044, G03F 7/2037Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-03-26Kousuke OHYAMA | pending |
| PROCESSES FOR PREPARING 3-ISOPROPENYL-6-HEPTENAL COMPOUND AND 6-ISOPROPENYL-3-METHYL-3,9-DECADIENYL CARBOXYLATE COMPOUND, PROCESS FOR PREPARING INTERMEDIATE THEREOF, AND INTERMEDIATE THEREOFC07C 29/103, C07C 67/293, C07C 29/32, C07C 33/02, C07C 45/59, C07C 67/08, C07C 69/587, C07D 307/00, C07D 317/12, C07D 317/24, C07C 69/18, C07C 47/21, C07C 69/14Filed as Shin-Etsu Chemical Co., Ltd.2026-03-23Akihiro BABA | pending |
| ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESSG03F 7/0045, C07C 309/58, C07C 309/59, C07C 309/60, C07C 381/12, C08F 22/24, G03F 7/0397, G03F 7/2004, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2026-03-17Ryo Sudo | pending |
| COSMETIC COMPRISING A CROSSLINKED ORGANOSILOXANE POLYMERA61K 8/891, A61K 8/895, A61Q 19/00, A61K 8/20, A61K 8/31, A61K 8/345, A61K 8/365, A61K 8/37, A61K 8/893, A61K 8/894, A61K2800/10, A61K2800/54, A61K2800/5922, A61K2800/95, A61Q 1/02, A61Q 1/04, A61Q 1/06, A61Q 1/10, A61Q 1/12, A61Q 5/00, A61Q 5/06, A61Q 5/12, A61Q 15/00, A61Q 17/04, A61Q 19/007Filed as Shin-Etsu Chemical Co., Ltd.2026-03-10Emi AKABANE | pending |
| COATING AGENTC09D 5/022, C09D 183/04, C09D 7/65, C08G 77/12, C08G 77/20, C08L 83/04, C09D 5/024, C09D 175/04, C09D 183/10, C08L 83/00, C08K 5/56, C08L 83/14Filed as Shin-Etsu Chemical Co., Ltd.2026-03-10Yoshinori INOKUCHI | pending |
| RESIST COMPOSITION, LAMINATE, AND PATTERNING PROCESSG03F 7/0045, G03F 7/325, C07D 517/22, G03F 7/004, G03F 7/0042, G03F 7/038, G03F 7/0382, G03F 7/039, G03F 7/0392, G03F 7/0397, G03F 7/091, G03F 7/094, G03F 7/11, G03F 7/322Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-03-04Satoshi KUSAMA | pending |
| PREPARATION OF POLYMER, PREPARATION OF CHEMICALLY AMPLIFIED RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, POLYMER, AND CHEMICALLY AMPLIFIED RESIST COMPOSITIONG03F 7/0397, C08F 22/1006, C07C 309/12, C07C 381/12, G03F 7/0045, G03F 7/0046, G03F 7/0382, G03F 7/0384, G03F 7/0392, G03F 7/0395, G03F 7/2041, G03F 7/70025, G03F 7/70341Filed as Shin-Etsu Chemical Co., Ltd.2026-02-24Ryo Sudo | pending |
| CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESSG03F 7/0392, G03F 1/22, G03F 7/004, G03F 7/0045, G03F 7/0046, G03F 7/0397, G03F 7/20, G03F 7/2037, G03F 7/2059, G03F 7/322Filed as Shin-Etsu Chemical Co., Ltd.2026-02-20Masahiro Fukushima | pending |
| ANTI-FOULING SILICONE COMPOSITE SHEET AND METHOD FOR PERFORMING PREVENTION OF GRAFFITI BY USING THE SAMEC09J 7/20, C09J 7/38, C09D 5/16, C09J 7/255, C09J 7/201, B32B 7/12, B32B2367/00, C08G 77/20, C08G 77/24, C09D 5/1637, C09D 5/1675, C09D 183/00, C09D 183/04, C09D 183/08, C09J 183/04, C09J2427/005, C09J2483/00, C09J2483/005, E04F 13/07, E04H 17/00Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-02-19Akihiro ENDO | pending |
| FILM-FORMING MATERIAL, FILM-FORMING SLURRY, SPRAY COATED FILM, AND SPRAY COATED MEMBERC23C 4/11, C23C 4/04, C23C 4/134, C01F 17/212, C01F 17/265, C01F 17/20, C01F 17/224, C01F 17/218Filed as Shin-Etsu Chemical Co., Ltd.2026-02-10Ryo Iwasaki | pending |
| CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESSG03F 7/004, G03F 7/0045, C08F 212/24, C08F 12/32, G03F 7/0046, G03F 7/0382, G03F 7/0392, G03F 7/0397, G03F 7/2004, G03F 7/322Filed as Shin-Etsu Chemical Co., Ltd.2026-02-06Masahiro Fukushima | pending |
| REFLECTIVE MASK BLANK AND REFLECTIVE MASKG03F 1/24, G03F 1/22, G03F 1/38, G03F 1/48, G03F 1/50, G03F 1/52, G03F 1/54, G03F 1/58, G03F 1/62, G03F 1/80Filed as Shin-Etsu Chemical Co., Ltd.2026-02-05Taiga OGOSE | pending |
| ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING METHODC07C 309/12, C07D 333/46, G03F 7/0045, G03F 7/0392, C07C2601/08, C07C2602/42, C07C2603/74, C07C2601/18, C07C2603/86, C07C2601/16, C07C2601/20, C07C2602/28, C07C2603/18, C07C2603/68, C08F 212/24, C08F 212/30, C08F 220/382, C07C 25/18, C07C 43/225, C07C 63/70, C07C 205/12, C07C 381/12, C07D 279/20, C07D 327/06, C07D 327/08, C07D 333/54, C07D 333/56, C07D 333/74, C07D 333/76, C07D 335/02, C07D 335/12, C07D 335/16, C07D 339/08, C08F 220/10, G03F 7/004, G03F 7/0046, G03F 7/0382, G03F 7/0397, G03F 7/11, G03F 7/2004, G03F 7/2041, C08F 220/22, C08F 220/1806, C08F 220/40, C08F 212/20Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-02-04Daisuke KORI | pending |
| THERMOSETTING MALEIMIDE RESIN COMPOSITION FOR STRESS-RELIEF LAYER FOR GLASS-CORE SUBSTRATE AND PRINTED WIRING BOARD INCLUDING THE SAMEC08L 79/085, C09J 163/00, B32B2307/7376, B32B 7/12, B32B 15/20, B32B 17/061, B32B2250/02, B32B2311/12, B32B2457/08, C08G 59/245, C08G 59/28, C08G 59/3218, C08G 59/3227, C08G 59/38, C08G 59/4042, C08G 59/686, C08G 59/688, C08G 73/12, C08G 73/124, C08L 63/00, C09J 5/06, H05K 1/0271, H05K 1/03, C08K 5/3445, C08K 5/3492, C08K 5/50, C08K 3/36Filed as Shin-Etsu Chemical Co., Ltd.2026-01-22Yoshihiro TSUTSUMI | pending |
| SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING METHODC07C 381/12, G03F 7/0045, G03F 7/0392, C07C2603/88, C07C 309/12, C07C 309/17, C07D 279/22, C07D 307/32, C07D 307/33, C07D 317/08, C07D 317/24, C07D 317/70, C07D 319/08, C07D 327/08, C07D 333/76, C07D 339/08, C08F 20/38, G03F 7/004, G03F 7/0046, G03F 7/0382, G03F 7/0397, G03F 7/20, G03F 7/2004Filed as Shin-Etsu Chemical Co., Ltd.2026-01-20Masahiro Fukushima | pending |
| SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESSC07C 381/12, G03F 7/0045, G03F 7/0392, C07C2601/08, C07C2601/14, C07C 63/70, C07C 65/10, C07C 65/21, C07C 69/76, C07C 69/80, C07C 309/06, C07C 323/20, C07C 323/62, C07D 279/20, C07D 307/12, C07D 327/08, C07D 333/76, C07D 335/12, C07D 339/08, C08F 20/68, G03F 7/004, G03F 7/0382, G03F 7/0397, G03F 7/2004, G03F 7/30, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2026-01-16Masahiro Fukushima | pending |
| SILICON-CONTAINING COMPOSITION AND PATTERNING PROCESSC09D 133/10, G03F 7/00, G03F 7/0752, G03F 7/0757, C09D 7/65, H10P 76/20, C09D 133/08, C09D 183/04, C09D 183/06, C09D 183/08, G03F 7/0002, G03F 7/094, G03F 7/11, G03F 7/20, C08L 33/14Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-01-16Yuji HARADA | pending |
| SILICON-CONTAINING COMPOSITION AND PATTERNING PROCESSC09D 133/10, G03F 7/0035, G03F 7/0752, G03F 7/0757, C09D 7/65, H10P 76/2041, H10P 76/20, C09D 133/08, C09D 183/04, C09D 183/06, C09D 183/08, G03F 7/094, G03F 7/11, G03F 7/20, C08L 25/18Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-01-16Yuji HARADA | pending |
| SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESSC07C 381/12, G03F 7/0392, C07C2601/08, C07C2602/10, C07C2603/74, C07C2603/72, C07C2601/14, C07C 309/42, C07C 309/43, C07C 309/58, C07C 309/71, C07C 309/73, C07D 279/20, C07D 307/00, C07D 307/93, C07D 327/08, C07D 333/76, C07D 335/12, C07D 339/08, C07D 493/08, G03F 7/004, G03F 7/0045, G03F 7/0046, G03F 7/0382, G03F 7/0397, G03F 7/2004, G03F 7/30, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2026-01-15Masahiro Fukushima | pending |
| SULFONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING METHODC07C 381/12, C07D 333/76, G03F 7/0045, C07C2601/08, C07C2603/74, C07C2601/14, C08F 220/1806, C08F 212/24, C08F 212/22, C08F 212/30, C08F 220/301, C07C 309/42, C07C 309/43, C07C 309/73, C07D 279/20, C07D 327/08, C07D 335/12, C07D 335/16, C07D 493/08, C07D 495/08, C08F 12/16, C08F 12/20, C08F 12/22, C08F 12/30, C08F 12/32, C08F 220/22, C08F2800/10, C09D 125/18, G03F 7/004, G03F 7/0046, G03F 7/0392, G03F 7/0397, G03F 7/2004, G03F 7/30, G03F 7/70033, C08F 212/20Filed as Shin-Etsu Chemical Co., Ltd.2026-01-15Masahiro Fukushima | pending |
| SULFONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING METHODC07C 381/12, C08F 220/22, G03F 7/004, G03F 7/0392, C07C2601/08, C07C2603/68, C08F 220/1806, C08F 212/24, C08F 212/30, C08F 220/301, C08F 220/382, C07C 309/12, C07C 309/17, C07C 309/24, C07C 309/73, C07D 327/08, C07D 333/76, C08F 12/16, C08F 12/20, C08F 12/22, C08F 12/30, C08F 12/32, C08F 212/32, C09D 125/18, G03F 1/56, G03F 7/0045, G03F 7/0046, G03F 7/0382, G03F 7/0397, G03F 7/20, G03F 7/2004, G03F 7/30, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2026-01-15Masahiro Fukushima | pending |
| SULFONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING METHODC07C 381/12, C08F 220/22, G03F 7/0392, G03F 7/20, C07C2601/08, C07C2601/14, C08F 220/1807, C08F 220/1806, C08F 212/24, C08F 212/30, C08F 220/301, C08F 220/382, C07C 59/135, C07C 65/28, C07C 69/76, C07C 309/42, C07C 309/73, C07D 279/20, C07D 327/08, C07D 333/76, C07D 335/12, C08F 212/32, C09D 125/18, G03F 7/004, G03F 7/0045, G03F 7/0382, G03F 7/0397, G03F 7/2004, G03F 7/30, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2026-01-15Masahiro Fukushima | pending |
| RESIST COMPOSITION, LAMINATE AND PATTERNING PROCESSG03F 7/00, G03F 7/004, G03F 7/0045, G03F 7/0397, G03F 7/027, G03F 7/0388, G03F 7/039, G03F 7/0392, G03F 7/094, G03F 7/11, G03F 7/20, G03F 7/2004, G03F 7/322, G03F 7/70033Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-01-13Satoshi KUSAMA | pending |
| SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESSC07C 381/12, C07D 317/24, G03F 7/0045, C07C2601/08, C07C2603/74, C07C2601/16, C07C2603/88, C07C2601/14, C08F 212/24, C08F 220/1811, C07C 309/12, C07C 309/17, C07C 309/24, C07D 279/20, C07D 307/20, C07D 307/32, C07D 307/33, C07D 317/08, C07D 317/70, C07D 319/08, C07D 319/14, C07D 327/04, C07D 327/08, C07D 333/46, C07D 333/76, C07D 335/12, C07D 493/08, C07D 495/08, C08F 220/22, C08F 220/40, C08F2800/10, G03F 7/004, G03F 7/0046, G03F 7/0382, G03F 7/0392, G03F 7/0397, G03F 7/2004, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2026-01-13Masahiro Fukushima | pending |
| RESIST COMPOSITION, LAMINATE, AND PATTERNING PROCESSC07D 347/00, G03F 7/004, G03F 7/0045, G03F 7/09, C08F 20/04, C08G 63/00, G03F 7/027, G03F 7/038, G03F 7/0382, G03F 7/039, G03F 7/0392, G03F 7/0397, G03F 7/11, G03F 7/2004, G03F 7/30, G03F 7/325, G03F 7/70033Filed as SHIN-ETSU CHEMICAL CO., LTD.2026-01-13Shun KIKUCHI | pending |
| ORGANOPOLYSILOXANE COMPOUND AND PRODUCTION METHOD THEREOF, AND COMPOSITION CONTAINING SAID COMPOUNDC07F 7/1804, C08L 83/06, C07F 7/188, C08G 77/045, C08G 77/16, C08G 77/18, C08L 83/04, C09D 183/04, C09J 183/04, C09K 3/10, C09K 3/1018, C09K2200/0685, C08L 83/00, C08K 5/57Filed as Shin-Etsu Chemical Co., Ltd.2026-01-12Yudai IMASAKA | pending |
| CURABLE RESIN COMPOSITIONC09J 7/35, C08K 5/3445, C08L 79/085, C09J2301/304, C08G 73/1014, C08G 73/1042, C08G 73/1046, C08G 73/12, C08G 73/124, C09J 179/085, C09J2400/146, C09J2479/08, C08L 63/00, C08K 3/36Filed as Shin-Etsu Chemical Co., Ltd.2026-01-05Hiroyuki IGUCHI | pending |
| HYPERVALENT IODINE COMPOUND, RESIST COMPOSITION, LAMINATE OBTAINED FROM THE RESIST COMPOSITION, AND PATTERNING PROCESSC07C 381/00, C07C 381/12, G03F 7/004, G03F 7/027, C07C 71/00, C07D 347/00, G03F 1/56, G03F 1/76, G03F 7/0045, G03F 7/038, G03F 7/0382, G03F 7/0392, G03F 7/0397, G03F 7/0755, G03F 7/11, G03F 7/2004, G03F 7/325, G03F 7/70033Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-30Kousuke Ohyama | pending |
| LIGHT-TRANSMITTING ARTICLE AND METHOD FOR IMPROVING ALKALI RESISTANCE OF LIGHT-TRANSMITTING ARTICLEFiled as SHIN-ETSU CHEMICAL CO., LTD.2025-12-30Takashi UCHIDA | pending |
| HYDRAULIC COMPOSITIONC04B 24/383, C04B 28/02, C04B 28/04, B33Y 70/00, C04B 24/38, C04B 28/08, C04B2103/50, C04B2111/00181, C04B2103/0068, C04B 24/32, C04B 24/42Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-29Hidekazu KONISHI | pending |
| ORGANOPOLYSILOXANE HAVING TERTIARY AMINO GROUP IN MOLECULAR CHAIN AND METHOD FOR PRODUCING SAMEC08G 77/26Filed as Shin-Etsu Chemical Co., Ltd.2025-12-19Takuma WATANABE | pending |
| ORGANOPOLYSILOXANE HAVING TERTIARY AMINO GROUP IN MOLECULAR CHAIN AND METHOD FOR PRODUCING SAMEFiled as Shin-Etsu Chemical Co., Ltd.2025-12-19Takuma WATANABE | pending |
| POLYMERIZABLE MONOMER, POLYMER, CHEMICALLY-AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESSC07C 69/54, C08F 220/26, G03F 7/0397, C07C2601/08, C08F 212/24, G03F 7/0045, G03F 7/0046, G03F 7/0382, G03F 7/0392, G03F 7/2004, G03F 7/70033Filed as SHIN-ETSU CHEMICAL CO.,LTD.2025-12-19Masaki OHASHI | pending |
| MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESSC07D 207/27, C07D 207/333, C07D 211/68, C08F 220/1806, C08F 212/24, C08F 212/22, C08F 212/16, C08F 212/26, C08F 212/20, C07D 207/267, C07D 207/337, C07D 211/76, C07D 493/18, C08F 12/26, C08F 20/36, C08F 212/12, C08F 212/32, C08F 220/22, C09D 125/18, G03F 7/0045, G03F 7/0046, G03F 7/0382, G03F 7/0392, G03F 7/0397, G03F 7/2004, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2025-12-17Masahiro Fukushima | pending |
| COMPOUNDING AGENT FOR DIENE RUBBERS AND RUBBER COMPOSITIONC08G 77/12, B60C 1/0016, B60C 11/0008, B60C2011/0025, C08G 77/80, C08J 3/226, C08J2383/05, C08K 5/548, C08L 7/00, C08L 9/06, C08L2205/025, C08L2205/035, C08L2310/00Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-17Munenao HIROKAMI | pending |
| PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASKG03F 1/24, G03F 1/26, G03F 1/58, G03F 1/60, G03F 1/50, G03F 1/52, G03F 1/76, G03F 1/80Filed as Shin-Etsu Chemical Co., Ltd.2025-12-17Naoki MATSUHASHI | pending |
| ULTRAVIOLET-CURABLE SILICONE COMPOSITION FOR STEREOLITHOGRAPHY AND CURED PRODUCT THEREOFC09D 183/06, B33Y 70/00, C09D 7/62, C08G 77/20, C08G 77/80, C08K 9/06Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-16Nobuaki MATSUMOTO | pending |
| UV-CURABLE SILICONE COMPOSITION FOR STEREOLITHOGRAPHY, CURED PRODUCT THEREOF AND CURING METHODC08F 222/106, B33Y 70/10, C08F 2/50, C08G 77/442, C08K 9/04, C08K2201/005Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-16Nobuaki MATSUMOTO | pending |
| SURFACE-TREATED SOL-GEL SILICA PARTICLES, METHOD FOR PRODUCING SURFACE-TREATED SOL-GEL SILICA PARTICLES, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC IMAGE DEVELOPMENTG03G 9/0825Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-16Kazuyuki MATSUMURA | pending |
| REFLECTIVE PHOTOMASK, REFLECTIVE PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASKG03F 1/24, G03F 1/32, G03F 1/48, G03F 1/54, G03F 1/80, G03F 7/0005Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-15Keisuke SAKURAI | pending |
| REFLECTIVE PHOTOMASK, REFLECTIVE PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASKG03F 1/24, G03F 1/26, G03F 1/48, G03F 1/54, G03F 1/80, G03F 7/0005Filed as Shin-Etsu Chemical Co., Ltd.2025-12-15Ryoto KAWAMURA | pending |
| Reflective Photomask, Reflective Photomask Blank, and Method for Manufacturing Reflective PhotomaskG03F 1/24, C22C 5/04, G03F 1/32, G03F 1/48, G03F 1/54, G03F 1/80, G03F 7/0005Filed as Shin-Etsu Chemical Co., Ltd.2025-12-15Keisuke SAKURAI | pending |
| FLUOROPOLYETHER-BASED CURABLE COMPOSITION, CURED PRODUCT, AND ARTICLEC08G 59/329, C08G 59/308, C08G 59/5073Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-12Ryuto HAYASHI | pending |
| RESIST COMPOSITION, LAMINATE, AND PATTERNING PROCESSC07D 213/61, G03F 7/004, G03F 7/0045, G03F 7/16, C07D 213/89, C07D 231/16, C07D 333/28, C09D 133/02, G03F 7/038, G03F 7/0388, G03F 7/039, G03F 7/094, G03F 7/11, G03F 7/20, G03F 7/2004, G03F 7/30, G03F 7/70033Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-09Shun KIKUCHI | pending |
| RARE EARTH SINTERED MAGNETC22C 38/005, B22F 3/16, B22F 9/023, B22F 9/04, B22F2009/042, B22F2009/044, B22F2201/02, B22F2201/20, B22F2202/05, B22F2301/355, B22F2998/10, B22F2999/00, C22C 33/04, C22C 38/001, C22C 38/002, C22C 38/06, C22C 38/10, C22C 38/14, C22C 38/16, C22C2202/02, H01F 1/0577Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-08Yosuke Shinada | pending |
| BICYCLIC ACETYLENE ALCOHOL COMPOUND, ADDITION-CURABLE SILICONE COMPOSITION, AND THERMALLY CONDUCTIVE ADDITION-CURABLE SILICONE COMPOSITIONC08K 5/05, C08K 3/08, C08K2003/0806, C08K2201/001Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-08Keita KITAZAWA | pending |
| ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESSC07C 309/42, C07D 327/08, G03F 7/0045, C07C2601/08, C07C2602/42, C07C2601/10, C07C 25/18, C07C 43/225, C07C 309/43, C07C 381/00, C07C 381/12, C07D 333/76, C08F 20/38, G03F 1/22, G03F 1/50, G03F 7/00, G03F 7/0005, G03F 7/004, G03F 7/0046, G03F 7/039, G03F 7/0392, G03F 7/0397, G03F 7/2004, G03F 7/2059, G03F 7/70033Filed as Shin-Etsu Chemical Co., Ltd.2025-12-08Masahiro Fukushima | pending |
| RAW MATERIAL ALLOY FOR MAGNETIC REFRIGERATION MATERIAL AND MAGNETIC REFRIGERATION MATERIALC22C 38/005, C22C 38/002, C22C 38/02, C22C 38/04, C22C2202/02, H01F 1/14766Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-08Junya FUKUDA | pending |
| THERMALLY-CONDUCTIVE TWO-PART ADDITION-CURABLE SILICONE COMPOSITION, CURED PRODUCT, AND SHEETFiled as SHIN-ETSU CHEMICAL CO., LTD.2025-12-05Yuji TABATA | pending |
| INTEGRATED CIRCUIT AND METHOD FOR MANUFACTURING SAMEH10D 30/485, H10D 30/471, H10D 30/017, H01Q 1/2283Filed as SHIN-ETSU CHEMICAL CO., LTD.2025-12-04Hirokazu FUKIDOME | pending |
Filings are matched to the company by applicant name, so a subsidiary filing under its own name is only here if that name resolves to this company. The applicant is printed as filed, which makes a wrong match visible. A patent is not a product: most applications are never granted, and most grants are never built.