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KLA Corp Patents
What KLA Corp has filed at the patent office — applications as well as grants, because a filing is on the record eighteen months before anyone has to say what it was for.
KLAC on carbonthat →Filings on file
56
Granted
0
Still pending
56
Filed under
2 names
56 filings
Newest filing first. A pending application has no patent number yet, and most never get one.
| Invention | Patent |
|---|---|
| SYSTEMS AND METHODS FOR ABSOLUTE SAMPLE POSITIONINGH10P 72/53, G01B 11/002, H10W 46/301, H10P 72/0606, H10W 46/00, G01B 11/272Filed as KLA Corporation2026-06-01Yoav Grauer | pending |
| MICRO-LENS ARRAY FOR METAL-CHANNEL PHOTOMULTIPLIER TUBEH01J 43/18, H01J 43/12Filed as KLA Corporation2026-03-23Paul Donders | pending |
| CONTEXT BASED PROCESSES AUGMENTED BY CONTEXT ADDRESSABLE STORAGEFiled as KLA CORPORATION2026-03-23KRIS BHASKAR | pending |
| Context Based Processes Augmented by Context Addressable StorageG06T 7/0008, G06T 1/60, G06T2207/30148Filed as KLA Corporation2026-03-18Kris BHASKAR | pending |
| LOW-REFLECTIVITY BACK-ILLUMINATED IMAGE SENSORH10F 39/805, H10F 39/806, G01N 21/9501, H10F 39/8067, H10F 39/199, H10F 39/026, H10F 77/703, H10F 39/024, G01N 21/8806, G01N 21/8851Filed as KLA Corporation2026-03-16Yung-Ho Alex Chuang | pending |
| LASER SYNCHRONIZATION WITH TARGET MOTION FOR EUV SOURCE OPTIMIZATIONFiled as KLA CORPORATION2026-03-15PATRICK TAE | pending |
| FOCUS METROLOGY METHOD USING OVERLAY MEASUREMENT TOOLFiled as KLA CORPORATION2026-03-12BORIS JOHAN LOUIS HABETS | pending |
| Focus Metrology Method Using Overlay Measurement ToolG03F 7/706831, G01B 11/272, G03F 7/706849, G03F 7/706851, G03F 7/706845, G03F 7/705, G03F 7/70616, G03F 7/70625, G03F 7/70633, G03F 7/70641, G03F 7/70666, G03F 7/70991Filed as KLA Corporation2026-03-10Boris Johan Louis HABETS | pending |
| ELECTRIC FIELD INDUCED LIQUID JET BREAKUP INTO A CHAIN OF DROPLETSFiled as KLA CORPORATION2026-03-05ANTON TKACHEV | pending |
| IMAGE GRABBING MAPPING METHOD TO IMPROVE SYSTEM PRODUCTIVITY IN A SYSTEM WITH MULTIPLE ELECTRON BEAMSFiled as KLA CORPORATION2026-03-04YOUNGJIN CHOI | pending |
| ELECTRIC FIELD INDUCED LIQUID JET BREAKUP INTO A CHAIN OF DROPLETSH05G 2/0023, H05G 2/0025Filed as KLA Corporation2026-03-03Anton Tkachev | pending |
| A TWO LEVEL-SET BASED APPROACH FOR TRITONE ATTENUATED PHASE SHIFT MASKS (ATTPSM) AND RELATED APPLICATIONSFiled as KLA CORPORATION2026-03-03YING HE | pending |
| METHODS AND SYSTEMS FOR METROLOGY SYSTEM PARAMETER CALIBRATION BASED ON A TRAINED SYSTEM PARAMETER MODELFiled as KLA CORPORATION2026-02-18STILIAN IVANOV PANDEV | pending |
| INSTRUMENTED SUBSTRATE AND METHOD FOR IN SITU WAFER MEASUREMENTSFiled as KLA CORPORATION2026-02-15DALJEET SINGH KHURANA | pending |
| AUTOMATIC DEFECT CLASSIFICATION ANALYSISFiled as KLA CORPORATION2026-02-12TINGZHU LIU | pending |
| VACUUM CHUCK WITH BELLOW CAPSFiled as KLA CORPORATION2026-02-10STEPHEN SIDLETSKY | pending |
| COMBINED LASER SOURCES FOR SAMPLE CHARACTERIZATIONFiled as KLA CORPORATION2026-02-10GUOHENG ZHAO | pending |
| OZONE-BASED DUV LASER POWER ATTENUATIONFiled as KLA CORPORATION2026-02-10KRISTIAN DEHNE | pending |
| Methods And Systems For Metrology System Parameter Calibration Based On A Trained System Parameter ModelG03F 7/706845, G03F 7/70625, G03F 7/706849, G03F 7/706851, G03F 7/705, G03F 7/70616Filed as KLA Corporation2026-02-09Stilian Ivanov Pandev | pending |
| COMBINED LASER SOURCES FOR SAMPLE CHARACTERIZATIONG01N 21/8806, G01N 21/9501, G01N2021/1765, G01N2021/8825, G01N2021/8838, G01N2021/8848, G01N2201/06113, G01N2201/0631, G01N2201/0697, H01S 3/005, H01S 3/0057, H01S 3/0071, H01S 3/0085, H01S 3/0092, H01S 3/225, H01S 3/23, H01S 3/2383, H01S 5/4012Filed as KLA Corporation2026-02-06Guoheng Zhao | pending |
| TUNNEL OPTIC BEAM HOMOGENIZER FOR EUV ILLUMINATION SYSTEMSFiled as KLA CORPORATION2026-02-03FRANK CHILESE | pending |
| VACUUM CHUCK WITH BELLOW CAPSB25B 11/005, B23Q 3/088Filed as KLA Corporation2026-02-02Stephen Sidletsky | pending |
| HIGH-GAIN TIME-DELAY-INTEGRATION SENSOR FOR INSPECTION TOOLFiled as KLA CORPORATION2026-02-02SANGHOON BAE | pending |
| HIGH-GAIN TIME-DELAY-INTEGRATION SENSOR FOR INSPECTION TOOLH10F 39/1538, G01J 1/44, H10F 39/199, H10F 39/803, G01J2001/448, G01N 21/8806, G01N 21/9501Filed as KLA Corporation2026-01-30Sanghoon Bae | pending |
| ADD-ON MODULE ENABLING COST EFFECTIVE AND COMPACT SOLUTION FOR INSPECTING LARGE INTEGRATED CIRCUIT COMPONENTFiled as KLA CORPORATION2026-01-27JOHAN DE GREEVE | pending |
| HYBRID BEARING STAGEFiled as KLA CORPORATION2026-01-27AVIV BALAN | pending |
| Ozone-Based DUV Laser Power AttenuationH01S 3/10038, B01J 19/123, B01J2219/00186, C01B 13/11, C01B2201/90, H01S 3/0014, H01S 3/067, H01S 3/104, H01S 3/22Filed as KLA Corporation2026-01-23Kristian Dehne | pending |
| THERMAL PUMP WITH HEAT-EXCHANGING DISPLACERFiled as KLA CORPORATION2026-01-21ANATOLY SHCHEMELININ | pending |
| SIMULTANEOUS, MULTIPLE CHANNEL MEASUREMENTS OF SEMICONDUCTOR STRUCTURES AT DIFFERENT NOMINAL AZIMUTH ANGLESFiled as KLA CORPORATION2026-01-19AVI ABRAMOV | pending |
| THERMAL PUMP WITH HEAT-EXCHANGING DISPLACERF04B 37/085, F04B 53/08, F04B 39/06Filed as KLA Corporation2026-01-14Anatoly Shchemelinin | pending |
| DEFECT DETECTION VIA PATTERN SEGMENTATION FOR APPLICATIONS INCLUDING ARRAY HOT SPOT DETECTIONFiled as KLA CORPORATION2026-01-12HUCHENG LEE | pending |
| METHOD AND SYSTEM OF GROWING AND USING CESIUM LITHIUM BORATE CRYSTALSFiled as KLA CORPORATION2026-01-05JOHN FIELDEN | pending |
| OVERLAY METROLOGY SYSTEM WITH DIRECTION-ISOLATED IMAGINGFiled as KLA CORPORATION2025-12-29YOEL FELER | pending |
| INSTRUMENTED SUBSTRATE AND METHOD FOR IN SITU WAFER MEASUREMENTSH10P 72/0604, H10P 74/277, H10P 74/203, H10P 74/273Filed as KLA Corporation2025-12-26Daljeet Singh KHURANA | pending |
| SPLIT OBJECTIVE LENS FOR ELECTRON BEAMS TO ENHANCE TOPOGRAPHICAL IMAGINGFiled as KLA CORPORATION2025-12-18PENGNAN LU | pending |
| METHODS AND SYSTEMS FOR MAPPING SURFACE TOPOGRAPHY OF SEMICONDUCTOR SUBSTRATESFiled as KLA CORPORATION2025-12-18MARK KOOY | pending |
| ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY WITH STEP AND SETTLE STAGFiled as KLA CORPORATION2025-12-17JOHN GERLING | pending |
| SPECTRAL OVERLAY TARGETFiled as KLA CORPORATION2025-12-17AMNON MANASSEN | pending |
| BONDED WAFER METROLOGYFiled as KLA CORPORATION2025-12-13AVNER SAFRANI | pending |
| SYSTEM AND METHOD FOR SPECTROSCOPIC CRITICAL DIMENSION MEASUREMENT WITH TWO-DIMENSIONAL DETECTOR ASSEMBLYFiled as KLA CORPORATION2025-12-12MING DI | pending |
| MULTIWAVELENGTH MEASUREMENTS FOR SCANNING OVERLAY METROLOGYFiled as KLA CORPORATION2025-12-11ALON ALEXANDER VOLFMAN | pending |
| COHERENT OUTSIDE-THE-LENS IMAGING OF MOIRÉ TARGETS FOR OVERLAY METROLOGYFiled as KLA CORPORATION2025-12-11NIREEKSHAN K. REDDY | pending |
| EXTERNAL MOTOR ACTUATOR FOR AN X/Y STAGEFiled as KLA CORPORATION2025-12-10AVIV BALAN | pending |
| METHOD AND SYSTEM OF GROWING AND USING CESIUM LITHIUM BORATE CRYSTALSC30B 9/12, C30B 29/22, G01N 21/01, G01N 21/8806, G01N2201/06113, H01S 3/0092, H01S 3/1666Filed as KLA Corporation2025-12-09John Fielden | pending |
| METHODS AND SYSTEMS FOR MEASUREMENT OF LARGE DIMENSION STRUCTURES FABRICATED USING SEMICONDUCTOR PROCESSING TECHNIQUESFiled as KLA CORPORATION2025-11-27HOUSSAM CHOUAIB | pending |
| SYSTEM AND METHOD FOR OPTIMIZING THROUGH SILICON VIA OVERLAYH10P 72/0616, H10P 72/0474, G03F 7/70516, H10P 72/0604, H10P 72/0428, H10P 72/0438, H10P 72/0472, H10W 10/181, H10W 72/0198, H10P 72/0421, H10P 90/1914, G03F 7/70633, G03F 7/70783, G03F 9/7003Filed as KLA Corporation2025-11-24Franz Zach | pending |
| ZERO-ORDER OVERLAY METROLOGYFiled as KLA CORPORATION2025-11-24AMNON MANASSEN | pending |
| REFILLABLE LAMP FOR LASER SUSTAINED PLASMA LIGHT SOURCEFiled as KLA CORPORATION2025-11-21ILYA BEZEL | pending |
| SPECTRAL RANGE EXTENSION FOR LASER-SUSTAINED PLASMA LIGHT COLLECTIONFiled as KLA CORPORATION2025-11-21MARKUS MINGEBACH | pending |
| VUV LASER-SUSTAINED PLASMA LIGHT SOURCE WITH DIRECT GAS FLOWFiled as KLA CORPORATION2025-11-20ILYA BEZEL | pending |
| OVERLAY METROLOGY TARGETFiled as KLA CORPORATION2025-11-20ROIE VOLKOVICH | pending |
| METHODS AND SYSTEMS OF FILM FRAME PRE-ALIGNMENT FOR SEMICONDUCTOR MEASUREMENT EQUIPMENTFiled as KLA CORPORATION2025-11-19AVNER SAFRANI | pending |
| VUV LASER-SUSTAINED PLASMA LIGHT SOURCE WITH DIRECT GAS FLOWH01J 61/28, H01J 65/04, H01J 61/025, H01J 61/16, H01J 65/042Filed as KLA Corporation2025-11-18Ilya Bezel | pending |
| AUTOMATED FOCUSING SYSTEM FOR TRACKING SPECIMEN SURFACE WITH A CONFIGURABLE FOCUS OFFSETG02B 21/0016, G02B 21/006, G02B 21/245, G02B 21/0032, G02B 21/008, G02B 21/244, G02B 21/364, G02B 21/365, G03F 1/84, G03F 7/7065Filed as KLA Corporation2025-11-17Xiumei Liu | pending |
| ENCODING DESIGN INFORMATION FOR A SPECIMEN FOR RUNTIME USE IN INSPECTION AND OTHER PROCESSESFiled as KLA CORPORATION2025-11-14GORDON ROUSE | pending |
| HIGH POWER 193 NANOMETER CONTINUOUS-WAVE LASER LIGHTFiled as KLA CORPORATION2025-11-12XIAOXU LU | pending |
Filings are matched to the company by applicant name, so a subsidiary filing under its own name is only here if that name resolves to this company. The applicant is printed as filed, which makes a wrong match visible. A patent is not a product: most applications are never granted, and most grants are never built.
More on KLAC
Company overviewEverything on KLAC in one place, with the price.SEC filingsWhat KLAC's 8-Ks say happened: results, departures, auditor changes.Insider tradingWhat KLAC's own officers and directors buy and sell.Planned salesSales KLAC insiders have filed notice of.Executive payWhat KLAC awarded its chief executive, and what it became.Who owns itEvery manager reporting a position in KLAC.Funds holding itWhich funds and ETFs hold KLAC, and how big a bet.LobbyingWhat KLAC spends lobbying Congress, and on what.Who lobbies for itThe lobbyists on KLAC's account, and who they worked for.Federal contractsWhat federal agencies pay KLAC.